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The plasma system consists of a glass tube with a diameter of 0.5 mm or larger, if desired. The electrodes are separated by 10 mm. Helium, argon or cold dry air can be used as a plasma gas source. An applied high voltage between the electrodes causes the gas to breakdown within the central core of the glass capillary generating atmospheric plasma. Nanostructures colloids/organic/inorganic precursors are placed in a glass container with an inlet and outlet for carrier gas and are seated on an ultrasonic nebuliser. The aerosol is then carried into the plasma stream by the carrier gas and is deposited. The atmospheric plasma deposition system can be modified for depositing multiple materials, either simultaneously or sequentially, and for high-throughput processing by having multiple jets. Each capillary can either be connected to the container containing a single precursor material or to different containers containing different precursor materials to facilitate multiple depositions. The multi-jet plasma system can be automated and controlled individually to precisely control surface characteristics. This technique is independent of the chosen substrate, and has proven to work for many substrates, including paper, plastic, semiconductors and metals.